{"number":"JP2023123222A","kindCode":"A","documentType":"publication","title":{"original":"レジスト組成物、レジストパターン形成方法、化合物、及び高分子化合物","english":"RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, COMPOUND, AND POLYMER COMPOUND"},"abstract":{"original":"【課題】高感度化が図れ、且つ解像性が良好なレジスト組成物、当該レジスト組成物を用いたレジストパターン形成方法、当該レジスト組成物が含有する樹脂、及び前記樹脂の合成に用いられる化合物の提供。【解決手段】式（ａ０－１）で表される構成単位と式（ａ１０－１）で表される構成単位とを有する樹脂成分（Ａ１）、を含有するレジスト組成物。Ｒ及びＲｘ１は水素原子等；Ｙ０１、Ｌ０１、Ｙａｘ１は単結合又は２価の連結基；Ｒｘ０１は式（Ｒｘ０－１）で表される酸解離性基；ｍ０１は０～２の整数；ｎ０１は０～４の整数；Ｃ０１は炭素原子；Ｘ０１はＣ０１と共に脂肪族単環式基を形成する基；Ｒ０１は水素原子等；ただし、式（ａ０－１）中のｎ０１が０のとき、Ｒ０１は水素原子。Ｗａｘ１は芳香族炭化水素基。 【選択図】なし","english":"To provide: a resist composition which achieves high sensitivity and has good resolution; a resist pattern formation method using the resist composition; a resin contained in the resist composition; and a compound used for synthesizing the resin.SOLUTION: There is provided a resist composition which comprises a resin component (A1) having a constitutional unit represented by the formula (a0-1) and a constitutional unit represented by the formula (a10-1).…"},"applicants":["Tokyo Ohka Kogyo Co Ltd"],"inventors":["広樹 加藤","Hiroki Kato","諒大 小林","Ryota Kobayashi","真 佐藤","Makoto Sato"],"filingDate":"2022-02-24","publicationDate":null,"grantDate":null,"verifiedWithOffice":false,"pdfUrl":"https://downloadpatent.com/pdf/JP2023123222A.pdf","pages":{"en":"https://downloadpatent.com/patent/JP2023123222A","zh-Hant":"https://downloadpatent.com/zh-Hant/patent/JP2023123222A","ja":"https://downloadpatent.com/ja/patent/JP2023123222A"}}