{"number":"JP7446357B2","kindCode":"B2","documentType":"grant","title":{"original":"レジスト組成物及びレジストパターン形成方法","english":"Resist composition and resist pattern forming method"},"abstract":{"original":null,"english":null},"applicants":["Tokyo Ohka Kogyo Co Ltd"],"inventors":["陽介 鈴木","健太 鈴木","孝裕 小島","潤 吉田","健吾 池内"],"filingDate":"2022-03-29","publicationDate":"2024-03-08","grantDate":"2024-03-08","verifiedWithOffice":false,"pdfUrl":"https://downloadpatent.com/pdf/JP7446357B2.pdf","pages":{"en":"https://downloadpatent.com/patent/JP7446357B2","zh-Hant":"https://downloadpatent.com/zh-Hant/patent/JP7446357B2","ja":"https://downloadpatent.com/ja/patent/JP7446357B2"}}