{"number":"JP7717621B2","kindCode":"B2","documentType":"grant","title":{"original":"感放射線性樹脂組成物及びレジストパターンの形成方法","english":"Radiation-sensitive resin composition and method for forming resist pattern"},"abstract":{"original":null,"english":null},"applicants":["JSR Corp"],"inventors":["龍一 根本","康太 古市","甫 稲見"],"filingDate":"2020-12-22","publicationDate":"2025-08-04","grantDate":"2025-08-04","verifiedWithOffice":false,"pdfUrl":"https://downloadpatent.com/pdf/JP7717621B2.pdf","pages":{"en":"https://downloadpatent.com/patent/JP7717621B2","zh-Hant":"https://downloadpatent.com/zh-Hant/patent/JP7717621B2","ja":"https://downloadpatent.com/ja/patent/JP7717621B2"}}