{"number":"US12696908B2","kindCode":"B2","documentType":"grant","title":{"original":"Reactive gas, reactive gas generation system and product treatment using reactive gas","english":"Reactive gas, reactive gas generation system and product treatment using reactive gas"},"abstract":{"original":"A method of treating a product or surface with a reactive gas, comprises producing the reactive gas by forming a high-voltage cold plasma (HVCP) from a working gas; transporting the reactive gas at least 5 cm away from the HVCP; followed by contacting the product or surface with the reactive gas. The HVCP does not contact the product or surface.","english":"A method of treating a product or surface with a reactive gas, comprises producing the reactive gas by forming a high-voltage cold plasma (HVCP) from a working gas; transporting the reactive gas at least 5 cm away from the HVCP; followed by contacting the product or surface with the reactive gas. The HVCP does not contact the product or surface."},"applicants":["NanoGuard Technologies, LLC"],"inventors":["Kevin M. Keener","Mark A. Hochwalt"],"filingDate":"2023-12-20","publicationDate":"2026-08-04","grantDate":"2026-08-04","verifiedWithOffice":true,"pdfUrl":"https://downloadpatent.com/pdf/US12696908B2.pdf","pages":{"en":"https://downloadpatent.com/patent/US12696908B2","zh-Hant":"https://downloadpatent.com/zh-Hant/patent/US12696908B2","ja":"https://downloadpatent.com/ja/patent/US12696908B2"}}