{"number":"US12702961B2","kindCode":"B2","documentType":"grant","title":{"original":"Resistivity adjustment device and resistivity adjustment method","english":"Resistivity adjustment device and resistivity adjustment method"},"abstract":{"original":"Even when the flow rate at which liquid is supplied varies, the variation in the resistivity of resistivity-adjusted liquid is suppressed by using a simple structure. The hollow fiber membrane module is sectioned into a liquid-phase region and a gas-phase region by hollow fiber membranes. The liquid-phase region receives liquid L whose resistivity is to be adjusted. The gas-phase region receives adjustment gas G used to adjust a resistivity of the liquid L.…","english":"Even when the flow rate at which liquid is supplied varies, the variation in the resistivity of resistivity-adjusted liquid is suppressed by using a simple structure. The hollow fiber membrane module is sectioned into a liquid-phase region and a gas-phase region by hollow fiber membranes. The liquid-phase region receives liquid L whose resistivity is to be adjusted. The gas-phase region receives adjustment gas G used to adjust a resistivity of the liquid L.…"},"applicants":["DIC Corporation"],"inventors":["Daijirou Anzai","Naoki Hada","Kazumi Oi"],"filingDate":"2023-12-18","publicationDate":"2026-08-11","grantDate":"2026-08-11","verifiedWithOffice":true,"pdfUrl":"https://downloadpatent.com/pdf/US12702961B2.pdf","pages":{"en":"https://downloadpatent.com/patent/US12702961B2","zh-Hant":"https://downloadpatent.com/zh-Hant/patent/US12702961B2","ja":"https://downloadpatent.com/ja/patent/US12702961B2"}}