{"number":"US12703013B2","kindCode":"B2","documentType":"grant","title":{"original":"Substrate processing method and substrate processing apparatus","english":"Substrate processing method and substrate processing apparatus"},"abstract":{"original":"The present invention relates to a substrate processing method and a substrate processing apparatus. A substrate processing method includes: a rinsing liquid/brush cleaning step of moving a brush exerting force onto an upper surface of a substrate from a center of the substrate toward a perimeter of the substrate while causing a fixed nozzle to discharge a rinsing liquid onto the upper surface of the substrate rotated by a holding and rotating unit; a rinsing liquid stopping step of stopping discharge of the rinsing liquid from the fixed nozzle when the brush having moved toward the perimeter …","english":"The present invention relates to a substrate processing method and a substrate processing apparatus. A substrate processing method includes: a rinsing liquid/brush cleaning step of moving a brush exerting force onto an upper surface of a substrate from a center of the substrate toward a perimeter of the substrate while causing a fixed nozzle to discharge a rinsing liquid onto the upper surface of the substrate rotated by a holding and rotating unit; a rinsing liquid stopping step of stopping discharge of the rinsing liquid from the fixed nozzle when the brush having moved toward the perimeter …"},"applicants":["SCREEN Holdings Co., Ltd."],"inventors":["Tsungju LIN","Hiroaki ISHII"],"filingDate":"2024-09-16","publicationDate":"2026-08-11","grantDate":"2026-08-11","verifiedWithOffice":true,"pdfUrl":"https://downloadpatent.com/pdf/US12703013B2.pdf","pages":{"en":"https://downloadpatent.com/patent/US12703013B2","zh-Hant":"https://downloadpatent.com/zh-Hant/patent/US12703013B2","ja":"https://downloadpatent.com/ja/patent/US12703013B2"}}