美國
US 12,702,872 B2
Annular unit for moisture management in respiratory mask
US 12,702,872 B2 是美國專利商標局（USPTO）的核准專利，日期 2026-08-11。申請人：HONEYWELL SAFETY PRODUCTS USA, INC.。PDF 可在本頁下載，未登入每天最多 5 篇。
- 申請人
- HONEYWELL SAFETY PRODUCTS USA, INC.
- 發明人
- Anna Liu; Linan Zhao; Kevin Lu
- 公開日
- 2026-08-11
- 申請日
- 2020-11-11
- 文件種類
- B2 核准公告
- 也寫作
- US 12,702,872 B2 · US12702872 · 12702872
摘要
Examples of the present disclosure relate generally to absorbing elements in respiratory face masks. In some examples, a structure for respiratory masks that can both absorb moisture from the face (such as perspiration, as well as from condensed moisture in the breath), and maintain a low breath resistance (won't increase the breath resistance significantly) is disclosed herein. The structure includes an annular structure added to the respiratory masks for moisture management. In some examples, the annular structure is made up of moisture absorbent materials.…
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專利局網站： 美國專利商標局（USPTO）