美國
US 12,702,999 B2
Application apparatus and application method
US 12,702,999 B2 是美國專利商標局（USPTO）的核准專利，日期 2026-08-11。申請人：NTN Corporation; OSAKA UNIVERSITY。PDF 可在本頁下載，未登入每天最多 5 篇。
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- 申請人
- NTN Corporation; OSAKA UNIVERSITY
- 發明人
- Mitsuru AKASHI; Takami AKAGI; Atsushi ODA; Shohei CHIKAE; Haruka NAKAMURA
- 公開日
- 2026-08-11
- 申請日
- 2022-03-10
- 文件種類
- B2 核准公告
- 也寫作
- US 12,702,999 B2 · US12702999 · 12702999
摘要
An application apparatus includes: an application needle that applies, to a target, an application material having its viscosity changing under shear; a drive unit that moves the application needle up and down; and a controller that controls the drive unit to move the application needle such that shear is applied to the application material at a shear speed depending on a type of the application material and depending on a target application amount or a target application diameter.
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專利局網站： 美國專利商標局（USPTO）