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美國

US 12,703,060 B2

Environment-friendly polishing disc and processing technology thereof

US 12,703,060 B2 是美國專利商標局(USPTO)的核准專利,日期 2026-08-11。申請人:Iuen-chun Kim。PDF 可在本頁下載,未登入每天最多 5 篇。

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申請人
Iuen-chun Kim
發明人
Iuen-chun Kim; Yi Jin
公開日
2026-08-11
申請日
2021-11-29
文件種類
B2 核准公告
也寫作
US 12,703,060 B2 · US12703060 · 12703060

摘要

An environment-friendly polishing disc and a processing technology thereof are provided by the present disclosure, and the present disclosure is related to the field of industrial electronic technology. The environment-friendly polishing disc, comprising a lower backsheet, a soft polishing layer on an upper side of the lower backsheet, and the soft polishing layer is a polyurethane synthetic resin containing polishing powder, and an upper backsheet is provided on an upper side of the soft polishing layer, so as to solve the problems of high cost, low polishing efficiency and serious environmen…

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專利局網站: 美國專利商標局(USPTO)

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