Japan
JP 2023123222 A
レジスト組成物、レジストパターン形成方法、化合物、及び高分子化合物
English (machine translation): RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, COMPOUND, AND POLYMER COMPOUND
JP 2023123222 A is a published patent application from the Japan Patent Office (JPO). Applicant: Tokyo Ohka Kogyo Co Ltd. Its PDF downloads from this page without an account, up to 5 a day.
- Applicant
- Tokyo Ohka Kogyo Co Ltd
- Inventors
- 広樹 加藤; Hiroki Kato; 諒大 小林; Ryota Kobayashi; 真 佐藤; Makoto Sato
- Filing date
- 2022-02-24
- Document type
- A Published application
- Also written as
- JP 2023123222 A · JP2023123222
Abstract
【課題】高感度化が図れ、且つ解像性が良好なレジスト組成物、当該レジスト組成物を用いたレジストパターン形成方法、当該レジスト組成物が含有する樹脂、及び前記樹脂の合成に用いられる化合物の提供。【解決手段】式（ａ０－１）で表される構成単位と式（ａ１０－１）で表される構成単位とを有する樹脂成分（Ａ１）、を含有するレジスト組成物。Ｒ及びＲｘ１は水素原子等；Ｙ０１、Ｌ０１、Ｙａｘ１は単結合又は２価の連結基；Ｒｘ０１は式（Ｒｘ０－１）で表される酸解離性基；ｍ０１は０～２の整数；ｎ０１は０～４の整数；Ｃ０１は炭素原子；Ｘ０１はＣ０１と共に脂肪族単環式基を形成する基；Ｒ０１は水素原子等；ただし、式（ａ０－１）中のｎ０１が０のとき、Ｒ０１は水素原子。Ｗａｘ１は芳香族炭化水素基。 【選択図】なし
English (machine translation): To provide: a resist composition which achieves high sensitivity and has good resolution; a resist pattern formation method using the resist composition; a resin contained in the resist composition; and a compound used for synthesizing the resin.SOLUTION: There is provided a resist composition which comprises a resin component (A1) having a constitutional unit represented by the formula (a0-1) and a constitutional unit represented by the formula (a10-1).…
The opening of the abstract. The full text is in the PDF.
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