Japan

JP 7446357 B2

レジスト組成物及びレジストパターン形成方法

English (machine translation): Resist composition and resist pattern forming method

JP 7446357 B2 is a granted patent from the Japan Patent Office (JPO), dated 2024-03-08. Applicant: Tokyo Ohka Kogyo Co Ltd. Its PDF downloads from this page without an account, up to 5 a day.

Applicant: Tokyo Ohka Kogyo Co Ltd
Inventors: 陽介鈴木; 健太鈴木; 孝裕小島; 潤吉田; 健吾池内
Publication date: 2024-03-08
Filing date: 2022-03-29
Document type: B2　Granted patent
Also written as: JP 7446357 B2 · JP7446357

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Patent office website: Japan Patent Office (JPO)

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