Japan
JP 7717621 B2
感放射線性樹脂組成物及びレジストパターンの形成方法
English (machine translation): Radiation-sensitive resin composition and method for forming resist pattern
JP 7717621 B2 is a granted patent from the Japan Patent Office (JPO), dated 2025-08-04. Applicant: JSR Corp. Its PDF downloads from this page without an account, up to 5 a day.
- Applicant
- JSR Corp
- Inventors
- 龍一 根本; 康太 古市; 甫 稲見
- Publication date
- 2025-08-04
- Filing date
- 2020-12-22
- Document type
- B2 Granted patent
- Also written as
- JP 7717621 B2 · JP7717621
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Patent office website: Japan Patent Office (JPO)
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