United States
US 12,697,766 B2
Imprint apparatus, imprint method, method of manufacturing article, determination method. and non-transitory computer-readable storage medium
US 12,697,766 B2 is a granted patent from the United States Patent and Trademark Office (USPTO), dated 2026-08-04. Applicant: CANON KABUSHIKI KAISHA. Its PDF downloads from this page without an account, up to 5 a day.
- Applicant
- CANON KABUSHIKI KAISHA
- Inventors
- Toshihiko Nishida
- Publication date
- 2026-08-04
- Filing date
- 2024-07-11
- Document type
- B2 Granted patent
- Also written as
- US 12,697,766 B2 · US12697766 · 12697766
Abstract
The present invention provides an imprint apparatus that forms a pattern of an imprint material on a substrate using a mold, the apparatus comprising: a supplier configured to supply the imprint material as a plurality of droplets onto the substrate; and a controller configured to control the supplier based on information indicating a target arrangement of the imprint material to be supplied as the plurality of droplets onto a predetermined region of the substrate, wherein the plurality of droplets in the target arrangement include a first droplet group including a plurality of first droplet a…
The opening of the abstract. The full text is in the PDF.
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Patent office website: United States Patent and Trademark Office (USPTO)
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