United States
US 12,702,999 B2
Application apparatus and application method
US 12,702,999 B2 is a granted patent from the United States Patent and Trademark Office (USPTO), dated 2026-08-11. Applicant: NTN Corporation; OSAKA UNIVERSITY. Its PDF downloads from this page without an account, up to 5 a day.
- Applicant
- NTN Corporation; OSAKA UNIVERSITY
- Inventors
- Mitsuru AKASHI; Takami AKAGI; Atsushi ODA; Shohei CHIKAE; Haruka NAKAMURA
- Publication date
- 2026-08-11
- Filing date
- 2022-03-10
- Document type
- B2 Granted patent
- Also written as
- US 12,702,999 B2 · US12702999 · 12702999
Abstract
An application apparatus includes: an application needle that applies, to a target, an application material having its viscosity changing under shear; a drive unit that moves the application needle up and down; and a controller that controls the drive unit to move the application needle such that shear is applied to the application material at a shear speed depending on a type of the application material and depending on a target application amount or a target application diameter.
The opening of the abstract. The full text is in the PDF.
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Patent office website: United States Patent and Trademark Office (USPTO)
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