United States
US 12,703,013 B2
Substrate processing method and substrate processing apparatus
US 12,703,013 B2 is a granted patent from the United States Patent and Trademark Office (USPTO), dated 2026-08-11. Applicant: SCREEN Holdings Co., Ltd. Its PDF downloads from this page without an account, up to 5 a day.
- Applicant
- SCREEN Holdings Co., Ltd.
- Inventors
- Tsungju LIN; Hiroaki ISHII
- Publication date
- 2026-08-11
- Filing date
- 2024-09-16
- Document type
- B2 Granted patent
- Also written as
- US 12,703,013 B2 · US12703013 · 12703013
Abstract
The present invention relates to a substrate processing method and a substrate processing apparatus. A substrate processing method includes: a rinsing liquid/brush cleaning step of moving a brush exerting force onto an upper surface of a substrate from a center of the substrate toward a perimeter of the substrate while causing a fixed nozzle to discharge a rinsing liquid onto the upper surface of the substrate rotated by a holding and rotating unit; a rinsing liquid stopping step of stopping discharge of the rinsing liquid from the fixed nozzle when the brush having moved toward the perimeter …
The opening of the abstract. The full text is in the PDF.
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Patent office website: United States Patent and Trademark Office (USPTO)
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