United States
US 12,703,060 B2
Environment-friendly polishing disc and processing technology thereof
US 12,703,060 B2 is a granted patent from the United States Patent and Trademark Office (USPTO), dated 2026-08-11. Applicant: Iuen-chun Kim. Its PDF downloads from this page without an account, up to 5 a day.
- Applicant
- Iuen-chun Kim
- Inventors
- Iuen-chun Kim; Yi Jin
- Publication date
- 2026-08-11
- Filing date
- 2021-11-29
- Document type
- B2 Granted patent
- Also written as
- US 12,703,060 B2 · US12703060 · 12703060
Abstract
An environment-friendly polishing disc and a processing technology thereof are provided by the present disclosure, and the present disclosure is related to the field of industrial electronic technology. The environment-friendly polishing disc, comprising a lower backsheet, a soft polishing layer on an upper side of the lower backsheet, and the soft polishing layer is a polyurethane synthetic resin containing polishing powder, and an upper backsheet is provided on an upper side of the soft polishing layer, so as to solve the problems of high cost, low polishing efficiency and serious environmen…
The opening of the abstract. The full text is in the PDF.
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Patent office website: United States Patent and Trademark Office (USPTO)
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